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OSK02TM101-102 series Infrared Guide Heating System

Infrared Guide Heating System
Application
    1. It is suitable for vacuum heating of the samples
    2. High speed temperature rising thermal processing of such elements as Si, SiC
    3. Producing thin film and oxide crystal preparation at the oxygen mixing atmosphere
    4. Analysis of laser abrasion and temperature-programmed desorption
    5. Built-in X-ray electric spectrometer, PLD device, and RTA device
Features
    1. It heats only materials and doesn't heat the objects around
    2. High-speed raising of temperature
    3. - It raises the temperature to 1500℃just in 1 minute (high-speed temperature raising)
    4. Clean heating
    5. - The heat source is in the atmosphere, therefore it doesn't get dirty
    6. The time and temperature control is easy
    7. It is possible to connect it with ICF70 flange of existing vacuum system
OSK02TM101-102 series Infrared Guide Heating System

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